Chiller Suitable for Silicon Wafer PVD Physical Vapor Deposition

After-sales Service: 1 Years
Warranty: 1 Years
Application: Industry, School, Hospital, Lab
Customized: Customized
Certification: CE, ISO
Structure: Portable

Products Details

Basic Info.

Model NO.
H Series
Material
Stainless Steel
Type
Refrigerator
Cooling Capacity
800-7200 W
Temperature Range
5-35
Temperature Precision
+/-0.2
Temperature Control Mode
Pid
Reservoir
120 L
Size of Connection
RP1 or 1/2
Condition
New
Transport Package
Pallet or Carton
Specification
620*1260*1162
Trademark
WIIP
Origin
China
HS Code
8418692090
Production Capacity
50000

Product Description

Product Introduction
Herii (H) series chiller is designed with, complete configuration, perfect protection, warning system, particularly for high-end analytical instruments. By equipped with standard water purification function, alarm protection of water flow, level and overheat. Herii (H) is able to provide RS485 communications and matching equipment with plentiful communication instructions.

Functions and Features
Intelligent PID temperature control with high stability;
Vertical appearance design with beautiful Hape, space saving;
Stainless steel water tank with large opening, easy to clean;
Optimized observed front filter, easily observe and replace the filter;
Various low noise and high performance;
Optional RS232/485 communications;


Typical Application
Herii (H) series Chiller is mainly used for supporting the Atomic Absorption Spectrophotometer(AAS), Inductively Coupled Plasma Optical Emission Spectrometry(ICP-OES), Inductively coupled plasma mass spectrometry (ICP-MS) , Scanning Electron Microscopy, High Frequency Fusion Machine, Glove Box, Plasma Etching Machine, Spectrometer, Aemission Spectrometer, Kjeldah Apparatus, Rotary Evaporator, Small reaction kettle and other laboratory laser laboratory instrument, etc.

Product Specifications

 

Model

Cooling Capacity W@25ºC 

Heating Capacity

Temperature Range

Temperature Stability

Max Flow

Max.
Pressure

Reservoir

Size of Connection

Overall Dimension

W*D*H

 ºC 50/60Hz

 ºC 50/60Hz

 ºC

 ºC

L/min

Bar

L

mm

sH1

800/900

300/350

5-35ºC

±0.1ºC

20

1.7

5

Rp 1/2

280x435x640-60

sH2

1400/1600

400

5-35ºC

20

1.7

8

Rp 1/2

330x505x710-60

sH3

2600/3000

810/1030

5-35ºC

50

3.6

12

Rp 1/2

380x565x830-60

sH4

3600

900

5-35ºC

50

3.6

20

Rp 1/2

430x635x940-70

sH5

5600/6500

1460

5-35ºC

50

4.6

30

Rp 1/2

490x715x995-70

sH6

6400/7200

1660/1880

5-35ºC

50

4.6

46

Rp 1/2

540x780x1115-90

 

 

 

 

 

 

 

 

 

 

sH1β

700/800

300/350

-20-35ºC

±0.2ºC

20

1.7

5

Rp 1/2

280x435x640-60

sH2β

1200/1350

400

-20-35ºC

20

1.7

8

Rp 1/2

330x505x710-60

sH3β

2200/2600

810/1030

-20-35ºC

50

3.6

12

Rp 1/2

380x565x830-60

sH4β

3300

900

-20-35ºC

50

3.6

20

Rp 1/2

430x635x940-70

sH5β

5200/5800

1460

-20-35ºC

50

4.6

30

Rp 1/2

490x715x995-70

sH6β

6000/6600

1660/1880

-20-35ºC

50

4.6

46

Rp 1/2

540x780x1115-90

 

 

 

 

 

 

 

 

 

 

rH1

800/900

100

5-35ºC

±1ºC

20

1.7

5

Rp 1/2

280x435x640-60

rH2

1400/1600

100

5-35ºC

20

1.7

8

Rp 1/2

330x505x710-60

rH3

2600/3000

250

5-35ºC

50

3.6

12

Rp 1/2

380x565x830-60

rH4

3600

250

5-35ºC

50

3.6

20

Rp 1/2

430x635x940-70

rH5

5600/6500

250

5-35ºC

50

4.6

30

Rp 1/2

490x715x995-70

rH6

6400/7200

250

5-35ºC

50

4.6

46

Rp 1/2

540x780x1115-90

 

 

 

 

 

 

 

 

 

 

sH1s

800/900

300/350

5-35ºC

±0.2ºC

20

1.7

2.5L

Rp 1/2

280x435x640-60

sH2s

1400/1600

400

5-35ºC

20

1.7

2.5L

Rp 1/2

330x505x710-60

sH3s

2600/3000

810/1030

5-35ºC

50

3.6

2.5L

Rp 1/2

380x565x830-60

sH4s

3600

900

5-35ºC

50

3.6

4L

Rp 1/2

430x635x940-70

sH5s

5600/6500

1460

5-35ºC

50

4.6

6L

Rp 1/2

490x715x995-70

sH6s

6400/7200

1660/1880

5-35ºC

50

4.6

8L

Rp 1/2

540x780x1115-90

 

 

 

 

 

 

 

 

 

 

sH2γ

900

550

-40-35ºC

±0.2ºC

10

1.5

2.5L

Rp 1/2

330x505x710-60

sH3γ

1200

800

-40-35ºC

20

3.5

2.5L

Rp 1/2

380x565x830-60

sH4γ

1800

1000

-40-35ºC

20

3.5

4L

Rp 1/2

430x635x940-70

sH5γ

2600

1280

-40-35ºC

20

3.5

6L

Rp 1/2

490x715x995-70

sH6γ

3600

1700

-40-35ºC

20

3.5

8L

Rp 1/2

540x780x1115-90


Chiller Suitable for Silicon Wafer PVD Physical Vapor DepositionChiller Suitable for Silicon Wafer PVD Physical Vapor DepositionChiller Suitable for Silicon Wafer PVD Physical Vapor DepositionChiller Suitable for Silicon Wafer PVD Physical Vapor DepositionChiller Suitable for Silicon Wafer PVD Physical Vapor DepositionChiller Suitable for Silicon Wafer PVD Physical Vapor DepositionChiller Suitable for Silicon Wafer PVD Physical Vapor DepositionChiller Suitable for Silicon Wafer PVD Physical Vapor DepositionChiller Suitable for Silicon Wafer PVD Physical Vapor Deposition

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