China Factory PCD/PDC Diamond Polishing Powder Synthetic Micron Diamond Powder for Tungsten Carbide Polishing

Type: Diamond
Classification of Diamond: Artificial
Characteristic: Hight Temperature
Characteristics of Natural Diamond: High Pressure
Application: Polishing, Grinding, Abrasive
Raw Material: Zhongnan

Products Details

Basic Info.

Model NO.
HIPCDN
Size
0.05um - 60um
Purity
99.9%
Color
Yellow
Delivery Time
3-5 Business Days
Transport Package
Plastic, Bottle, Carton
Specification
ISO9001
Trademark
Harmony
Origin
Zhengzhou China
HS Code
71051020
Production Capacity
20, 000, 000 Carat/Year

Product Description

High Purity Industrial Micron Diamond Powder For PCD PDC

 

Description:

Diamond powder is the hardest ultra-fine abrasive, which has been widely used in machinery, aerospace, optical instruments, glass, ceramics, electronics, petroleum, geology, and it is an Ideal material for grinding and polishing cemented carbide ceramics, gems, optical glass, etc. Generally, 0-0.5 micron diamond powder to 6-12 micron diamond powder is used for polishing. 10-15 micron to 22-36 micron is used for grinding. The coarser 12-22 micron is used for fine grinding.

 

In addition to the application of diamond powder as an abrasive material, another major application is to be used as a functional material. For example, use its thermal and electrical properties. By mixing diamond micropowder with thermosetting resin polymer, cellulose, phenolic resin or ceramic sheet, it can be made into a new material with improved thermal conductivity and reduced thermal expansion. Mixing diamond powder into metal sheets, such as nickel sheets or stainless steel sheets, can be made into new sheet materials with high thermal conductivity, low thermal expansion and light weight. In the electronics industry, it can be made into high-density and high-energy devices for thermal control.

 

The high-purity treatment of HID A+ and HID A series products using a proprietary post-treatment process ensures that the content of metal and non-metal impurity elements on the surface of the product is extremely low, and the reasonable particle gradation increases the particle tap density, which is more important when the composite sheet is synthesized. Easy to combine and grow stably. With super clean particles surface, total content of all kinds of metal impurities controlled at the ppm level.

 

Particle Size Distribution Specification for Superabrasive Grains

Size D10≥(µm) D50(µm) D95≤(µm) Max(µm) Min(µm)
0-0.25 0.1 0.170~0.210 0.38 -- --
0-0.5 0.12 0.220~0.280 0.51 --- --
0-1 0.42 0.501~0.580 0.795 1.156 0.375
0.5-1 0.472 0.581~0.690 1.053 1.375 0.375
0.5-1.5 0.504 0.691~0.871 1.298 1.945 0.375
0-2 0.62 0.872~0.985 1.542 2.312 0.446
1/2 0.761 0.986~1.224 1.894 3.27 0.63
0.5-3 0.94 1.225~1.487 2.401 3.889 0.63
1/3 1.048 1.488~1.712 2.882 4.625 0.75
1.5-3 1.169 1.713~2.014 3.321 5.5 0.75
2/3 1.392 2.015~2.302 3.663 6.541 0.892
2/4 1.644 2.303~2.754 4.496 7.778 0.892
2/5 1.803 2.755~3.312 5.5 9.25 1.06
3/6 2.448 3.313~3.898 6.386 11 1.499
3/7 2.913 3.899~4.676 7.566 13.08 1.783
4/8 3.605 4.677~5.400 8.455 15.56 2.121
4/9 3.952 5.401~6.062 9.762 18.5 2.522
5/10 4.401 6.063~6.700 10.98 18.5 2.999
5/12 5.022 6.701~7.673 12.95 22 3.566
6/12 5.807 7.674~8.549 13.97 26.16 4.241
7/14 6.411 8.550~9.483 15.13 26.16 4.241
8/16 7.113 9.484~10.78 17.82 31.11 5.044
8/20 8.102 10.79~12.56 20.6 37 5.998
10/20 9.186 12.57~14.18 22.54 37 7.133
12/22 10.53 14.19~16.05 24.41 44 7.133
12/25 12.01 16.06~17.65 26.61 44 8.482
15-25 13.32 17.66~19.55 29.75 52.33 10.09
20-30 15.04 19.56~22.50 34.64 62.23 12
22-36 17.28 22.51~26.12 39.98 74 12
30-40 20.11 26.13~30.10 46.56 88 14.27
30-50 22.36 30.11~34.58 52.87 88 16.96
36-54 25.68 34.59~39.00 60.94 104.7 20.17
40-60 29.45 39.01~43.20 69.86 124.5 20.17
50-70 32.42 43.21~47.50 72.65 124.5 23.99
54-80 36.56 47.51~52.50 80.74 124.5 23.99

 

Feature:

- Good & stable dispersion and suspension ability for both water-based and oil-based agent to ensure the grinding and polishing efficiency

- Narrow PSD, high content of very blocky shape particles

- Good heat resistance, high wear- resistance

- Complete sizes available.

China Factory PCD/PDC Diamond Polishing Powder Synthetic Micron Diamond Powder for Tungsten Carbide Polishing

 

Characteristics:

High purity with PPM level, narrow PSD, high content of very blocky shape particles, good & stable dispersion and suspension ability.

China Factory PCD/PDC Diamond Polishing Powder Synthetic Micron Diamond Powder for Tungsten Carbide Polishing

 

Application for Grade HID PCD/PDC Micron Diamond:

Without the need of further treatment, directly for making PCD/PDC, and diamond slurries for lapping, grinding, polishing on many kinds of material surface including needing special conditioning.

China Factory PCD/PDC Diamond Polishing Powder Synthetic Micron Diamond Powder for Tungsten Carbide Polishing

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