Basic Info.
Model NO.
Ta sputtering target
Grade
Industrial Grade
Main Market
Globle
Chemical Composition
99.95% Tantalum
Appearance
Shinny
Name
Tantalum Sputtering Target
Type
Square Target
Product Name
Ta Sputtering Target
Certificate
ISO9001
Transport Package
Vacuum Sealed Package Inside
Trademark
XK
Origin
Hunan, China
Production Capacity
1000 Piece/Pieces Per Month
Product Description
Product Description
Thin film coating materials 99.9% Tantalum(Ta) sputtering target
XK is a professional producer of Tantalum sputtering targets with various shapes and purity, which are mainly applied to semi-conductive & micro-electronics industry. Thanks to the special forming processes we used, our Tantalum sputtering targets possess higher density, smaller average particle size as well as high purity, as a result, you can benefit from a faster process due to higher sputtering speeds and obtain very homogeneous Tantalum layers.
| Product Name | Tantalum(Ta)sputtering target |
| Available Purity(%) | 99.9(3N), 99.95(3N5),99.99(4N) |
| Shape | Planar, rotary |
| Color | Gray |
| Size | as your request |
| Melting point() | 2996 |
| Density(g/cm³) | 16.654 |
| Boiling point() | 5425 |
| Technology | Vacuum Melting, Patented thermo-mechanical process and machine work |
| Application | Semiconductors, Micro-Electronics etc. |
