Metal Tin Target 99.99% Sn Magnetron Sputtering Target for PVD Applications

After-sales Service: Within 30 Days After Shipment
Condition: New
Certification: RoHS, ISO9001
Material: Pure Tin
Application: Metallurgy,Semiconductor,Evaporation
CAS No: 7440-31-5

Products Details

  • Overview
  • Product Description
  • Company Information
  • FAQ
Overview

Basic Info.

Model NO.
XK-Sn 01
Usage
PVD Film Coating
Shape
Plate,Circle,Pellets
Delivery Time
7-21days
Keywords
Metal Tin Metallurgy
Size
D50.8X3mm or as Request
Purity
99.9-99.99%
Chemical Composition
Sn
Appearance
Polished Surface
MOQ
1PCS
Product Name
Metal Tin Targets
Package
Vacuum Blister
Transport Package
Vacuum Sealed Package Inside
Specification
customized
Trademark
XinKang
Origin
Hunan, China
Production Capacity
1000000 Piece/Pieces Per Month

Product Description

Product Description
 

Introducing the XinKang Hot Sale Sn Tin Sputtering Target: crafted with an impeccable 99.99% purity, this Metal Tin Magnetron Target is perfect for Optical Thin Film Coating and Evaporation Experiments. Experience unparalleled performance in your PVD applications.

Metal Tin Target 99.99% Sn Magnetron Sputtering Target for PVD Applications
Name Metal Tin Sn Sputtering Targets
Purity 99.9%-99.99%
Size 1-10mm,10x10x10mm,D3x3mm, D6x6mm,2inch,3inch, As request
Symbol Sn
Density 7.29g/cm³
Melting Point 232
Shape Planar target, Rotary target.Pellets, Piece,
MOQ 1KGS
Application Experiments materials,Evaporation materials, PVD Film Coating and etc
 

Application of Tin Sputtering Target

The Tin Sputtering Target is a versatile tool used for thin film deposition across a wide range of cutting-edge applications. It is integral in fuel cells, decorative coatings, semiconductors, displays, LEDs, photovoltaic devices, and glass coatings. Moreover, tin is renowned for its corrosion-preventive properties when used to coat other metals. Tin alloys play a crucial role in various industries, especially in soft solder, tin bronze, and phosphor bronze. Highlighting its advanced applications, niobium-tin alloy is employed in the creation of superconducting magnets.

Below is a typical Certificate of Analysis for the 4N Tin Sputtering Target:

Analytical Methods:
1. Metallic elements were meticulously analyzed using ICP-OES.
2. Gas elements were precisely analyzed using LECO.

Metal Tin Target 99.99% Sn Magnetron Sputtering Target for PVD Applications

Application: Tin Metal Materials:

Other Related Sputtering Targets

Metal Target  Ni,Al,Cu,V,Co,W,Mo,Ta,Nb,Cr,Ti,Zr,Hf,Mg,Fe,Zn,Pb,Sn,Bi,Ga,Ge,In,Si,C,B,Te and rare earth targets
Alloy Target Ni,Fe,Co,Cu,Al alloy. and special alloy 
Evaporation Materials Ni,Al,Cu,V,Co,W,Mo,Ta,Nb,Cr,Ti,Zr,Hf,Mg,Fe,Zn,Pb,Sn,Bi,Ga,Ge,In,Si,C,B,Te and etc
Ceramic Targets Oxide Ceramic, Compound ceramic targets.
 
Company Information

Metal Tin Target 99.99% Sn Magnetron Sputtering Target for PVD Applications
FAQ

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